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Atomic layer deposition of zinc based transparent conductive oxides

 
: Gurram, Sanjeev Kumar

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Volltext urn:nbn:de:0011-n-4320329 (11 MByte PDF)
MD5 Fingerprint: 14516d11326bb4983f067d29b461ce1a
Erstellt am: 13.01.2018

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Stuttgart: Fraunhofer Verlag, 2017, 188 S.
Zugl.: Braunschweig, TU, Diss., 2016
Berichte aus Forschung und Entwicklung, 42
ISBN: 978-3-8396-1139-5
Englisch
Dissertation, Elektronische Publikation
Fraunhofer IST ()
nanotechnology; industrial chemistry & chemical engineering; testing of materials; electronic devices & materials; Materialwissenschaft; Nanotechnologie; Oberflächentechnologie; elektronische Materialien; Metrologie; Materialwissenschaftler; Oberflächen-Technologen; Halbleiter-Physiker; Chemiker; elektronische Materialien

Abstract
In this work Atomic Layer deposition of niobium and titanium doped ZnO based Transparent Conductive Oxide (TCO) coatings were developed. The fundamentals required for the deposition and doping of ZnO TCOs are discussed. The various opto-electronic properties of the niobium and titanium doped ZnO films were determined and compared. A model was proposed to explain the various changes in the opto-electronic properties of these films.

: http://publica.fraunhofer.de/dokumente/N-432032.html