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Ultrashort pulse laser processing of silica at high repetition rates - from network change to residual strain

: Zimmermann, F.; Lancry, M.; Plech, A.; Richter, S.; Ullsperger, T.; Poumellec, B.; Tünnermann, A.; Nolte, S.


International journal of applied glass science 8 (2017), Nr.2, S.233-238
ISSN: 2041-1286
ISSN: 2041-1294
Fraunhofer IOF ()

We report on the analysis of silica-based glasses after processing with ultrashort laser pulses at high repetition rates. Heat accumulation leads to strong local heating of the glass. The subsequent quenching results in a fictive temperature rise that scales with the repetition rate. Consequently, the relative volume change leads to residual tensile strain within the modified volume of larger than 10-3, which is confirmed by wide-angle X-ray scattering (WAXS) measurements. Studying the surface topography after cleaving of laser-modified regions allows for quantification of the corresponding elastic strain as well as the glass density behavior on the fictive temperature.