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Periodic sub-100nm structures fabricated by proximity i-line mask-aligner lithography (and self-aligned double patterning)

: Bourgin, Y.; Voigt, D.; Käsebier, T.; Kley, E.-B.; Zeitner, U.D.


Erdmann, A. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Optical Microlithography XXIX. Proceedings : 23-25 February 2016, San Jose, California, United States
Bellingham, WA: SPIE, 2016 (Proceedings of SPIE 9780)
ISBN: 978-1-5106-0015-7
Paper 978014
Conference "Optical Microlithography" <29, 2016, San Jose/Calif.>
Fraunhofer IOF ()

Diffractive mask-aligner lithography allows printing sub-micrometer resolution structures by using non-contact mode. For such a purpose, binary diffraction gratings are used as masks and are designed to transmit solely the ±1st diffraction orders. The high resolution interferogram is realized by the overlapping and the interference of the propagating beams. By applying the techniques known as Self-Aligned Double Patterning (SADP), it´s possible to decrease the period of the fabricated grating (350 nm) by a factor of two, and thus reaching the 90nm structure width. As application, metallic gratings have been fabricated operating as wire grid polarizer (WGP).