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An integrated source/mask/DSA optimization approach

: Fühner, T.; Michalak, P.; Welling, U.; Orozco-Rey, J.C.; Müller, M.


Erdmann, A. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Optical Microlithography XXIX. Proceedings : 23-25 February 2016, San Jose, California, United States
Bellingham, WA: SPIE, 2016 (Proceedings of SPIE 9780)
ISBN: 978-1-5106-0015-7
Art. 97800M
Conference "Optical Microlithography" <29, 2016, San Jose/Calif.>
Fraunhofer IISB ()

The introduction of DSA for lithography is still obstructed by a number of technical issues including the lack of a comprehensive computational platform. This work presents a direct source/mask/DSA optimization (SMDSAO) method, which incorporates standard lithographic metrics and figures of merit such as the maximization of process windows. The procedure is demonstrated for a contact doubling example, assuming grapho-epitaxy-DSA. To retain a feasible runtime, a geometry-based Interface Hamiltonian DSA model is employed. The feasibility of this approach is demonstrated through several results and their comparison with more rigorous DSA models.