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3D Simulation of Low Pressure Chemical Vapor Deposition

3D Simulation der chemischen Niederdruckgasphasenabscheidung
 
: Bär, E.; Lorenz, J.

Hill, C.:
ESSDERC '94. 24th European Solid State Device Research Conference. Proceedings
Gif-sur-Yvette: Editions Frontieres, 1994
ISBN: 2-86332-157-9
S.335-338
European Solid State Device Research Conference (ESSDERC) <24, 1994, Edinburgh>
Englisch
Konferenzbeitrag
Fraunhofer IIS B ( IISB) ()
chemical vapour deposition; process simulation; process modeling; chemische Gasphasenabscheidung; Prozeßsimulation; Prozeßmodellierung

Abstract
A new method for the three-dimensional (3D) simulation of LPCVD using a modified string algorithm combined with a redistribution model is presented. Simulation results for rectangular holes are shown. The step coverage predicted by 3D simulations is compared to step coverages from 2D simulations. It is shown that the considerable differences observed require the use of 3D algorithms for the simulation of LPCVD in deep submicron devices.

: http://publica.fraunhofer.de/dokumente/N-4225.html