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Hierarchical Manipulation of Block Copolymer Patterns on 3D Topographic Substrates: Beyond Graphoepitaxy

 
: Park, S.; Cheng, X.; Böker, A.; Tsarkova, L.

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Advanced Materials 28 (2016), Nr.32, S.6900-6905
ISSN: 0935-9648
ISSN: 1521-4095
Englisch
Zeitschriftenaufsatz
Fraunhofer IAP ()

Abstract
Templates of complex nanopatterns in a form of hierarchically sequenced dots and stripes can be generated in block copolymer films on lithography-free 3D topographic substrates. The approach exploits thickness- and swelling-responsive morphological behavior of block copolymers, and demonstrates novel possibilities of topography-guided registration of nanopatterns due to periodic confinement and spontaneous orthogonal flow-fields.

: http://publica.fraunhofer.de/dokumente/N-421764.html