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In-situ monitoring of optical coatings on architectural glass and comparison of the accuracy of the layer thicknesses attainable with ellipsometry and photometry

 
: Vergöhl, M.; Malkomes, N.; Matthee, T.; Bräuer, G.; Richter, U.; Nickol, F.-W.; Bruch, J.

Meinema, H.A.:
Advanced coatings on glass & plastics for large-area or high-volume products. Proceedings of the 3rd International Conference on Coatings on Glass 2000
Eindhoven: TNO/TPD, Division Materials Research & Technology, 2000
ISBN: 90-9014255-X
S.431-442
International Conference on Coatings on Glass (ICCG) <3, 2000, Maastricht>
Englisch
Konferenzbeitrag
Fraunhofer IST ()

Abstract
For the deposition of optical coatings on architectural glass, spectroscopic ellipsometry and spectral photometry have been applied. For the purpose of achieving a high competitiveness of manufacturing plants, high deposition rates as well as low scrap quanitities are important. The first can be obtained by using the mid-frequency (MF) sputtering technique developed in the beginning of the nineties for the deposition of highly isolating materials. The latter can be improved by using an effective plasma control and a monitor of the optical film properties. In order to obtain constant layer properties, not only the MF but also the directcurrent (DC) sputter process has to be stabilized within a relatively narrow process window, which necessitates a suitable plasma control as well as optical monitoring. Spectroscopic ellipsometry as well as spectral photometry are used for monitoring the optical properties of SnO2-based low-e-coatings on architectural glass. It is estimated that spectroscopic ellipsometry is distinctly more sensitive for monitoring the thicknesses of low-e coatings than spectral photometry.

: http://publica.fraunhofer.de/dokumente/N-4019.html