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2000
Conference Paper
Titel
Atmospheric pressure plasma deposition of a-C:H films in barrier discharges
Abstract
The plasma-activated deposition of amorphous hydrogenated carbon coatings at atmospheric pressure has been performed using dielectric barrier discharges. Ellipsometric and mechanical characterization of the films indicate a weakly crosslinked, polymer-like structure with low density and mechanical strength, compared to hard DLC coatings.