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Lloyd's mirror interference lithography with EUV radiation from a high-harmonic source

: Kim, H.; Baksh, P.; Odstrcil, M.; Miszczak, M.; Frey, J.G.; Juschkin, L.; Brocklesby, W.S.

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Applied physics express 9 (2016), Nr.7, Art. 076701, 5 S.
ISSN: 1882-0778
ISSN: 1882-0786
Zeitschriftenaufsatz, Elektronische Publikation
Fraunhofer ILT ()

We demonstrate interference lithography using a high-harmonic source. Extreme ultraviolet (EUV) radiation is produced by high-harmonic generation with 800 nm light from a femtosecond Ti:sapphire laser (40 fs pulses, 1 kHz, 2 W average power) in argon gas. Interference patterns created using Lloyd's mirror setup and monochromatized radiation at the 27th harmonic (29 nm) are recorded using a ZEP-520A photoresist, producing features with <200 nm pitch. The effect of the use of femtosecond pulsed EUV radiation on the recorded pattern is investigated. The capability of the high-harmonic source for high-resolution patterning is discussed.