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Ultra low-loss low-efficiency diffraction gratings

: Clausnitzer, T.; Kley, E.-B.; Tünnermann, A.; Bunkowski, A.; Burmeister, O.; Danzmann, K.; Schnabel, R.; Duparre, A.

Postprint (1.6 MByte; PDF; )

Optics Express 13 (2005), Nr.12, S.4370-4378
ISSN: 1094-4087
Zeitschriftenaufsatz, Elektronische Publikation
Fraunhofer IOF ()
dielectric materials; electromagnetic wave diffraction; interferometry; light absorption; light reflection; light scattering; thermal effect

The realization of ultra low-loss dielectric reflection gratings with diffraction efficiencies between 7% and 0.02% is presented. By placing the grating beneath the highly reflective layerstack scattering was significantly reduced. This concept allows the all-reflective coupling of high laser radiation to high finesse cavities, thereby circumventing thermal effects caused by absorption in the substrate.