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Determination of scattering losses in ArF* excimer laser all-dielectric mirrors for 193 nm microlithography application

: Rudisill, J.; Duparre, A.; Schröder, S.


Exarhos, G.J. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.; Lawrence Livermore National Laboratory:
Laser-induced damage in optical materials 2004 : 36th Annual Boulder Damage Symposium proceedings ; 20 - 22 September 2004, Boulder, Colorado
Bellingham/Wash.: SPIE, 2005 (SPIE Proceedings Series 5647)
ISBN: 0-8194-5607-1
Annual Boulder Damage Symposium <36, 2004, Boulder/Colo.>
Annual Symposium on Optical Materials for High-Power Lasers <36, 2004, Boulder/Colo.>
Fraunhofer IOF ()
scattering; thin film; coating; DUV; microlithography

The complete evaluation in the selection of coating designs for production of high performance mirrors must include the scattering losses that are associated with the thin film materials combination. This is especially true for deep ultraviolet [DUV] microlithography applications. Scattering loss data are presented at 193 nm for various coating material designs for operation in argon fluoride laser systems. For overall optimum performance tradeoffs of the spectral reflectance, environmental stability and pulsed laser irradiation lifetime survivability is also discussed.