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Nanostructure and optical properties of fluoride films for high-quality DUV/VUV optical components

: Schröder, S.; Uhlig, H.; Duparre, A.; Kaiser, N.


Amra,C.; Kaiser, N.; Macleod, H.A. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Advances in Optical Thin Films II : SPIE Conference on Optical Systems Design, 12-16 September 2005, Jena, Germany
Bellingham/Wash.: SPIE, 2005 (SPIE Proceedings Series 5963)
ISBN: 0-8194-5981-X
Conference on Optical Systems Design <2005, Jena, Germany>
Fraunhofer IOF ()
thin film; coating; Fluoride; SmF3; GdF3; YF 3; YbF3; DUV; VUV; reflectance; total scatter; angle resolved scatter

The persistent utilization of optical lithography at the DUV and VUV excimer laser wavelengths leads to extraordinary demands on the optical components involved (high throughput, low scattering, high mechanical stability, ...). Fluorides are the main or even the only candidates for film materials in these spectral regions because of their low absorption. There are several high-index and low-index fluoride materials. These materials, however, may significantly differ in their nanostructural properties leading to scatter losses crucially influencing the performance of the multilayers. In order to find optimal material combinations, HR multilayer mirrors were fabricated using several high-index fluoride film materials. Spectral photometry, atomic force microscopy, as well as total and angle resolved light scattering measurement and analysis were performed for comprehensive characterization.