Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.

Self-organized antireflective nanostructures on PMMA by ion etching

: Kaless, A.; Schulz, U.; Kaiser, N.


Duparre, A. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Optical fabrication, testing, and metrology II : 13 - 15 September 2005, Jena, Germany
Bellingham/Wash.: SPIE, 2005 (SPIE Proceedings Series 5965)
ISBN: 0-8194-5983-6
Conference "Optical Fabrication, Testing, and Metrology" <2005, Jena>
Fraunhofer IOF ()
plasma treatment; PMMA; antireflection; nanostructure; polymer optic

Stochastic, self-organized nanostructures are produced by a low-pressure plasma treatment on the polymer polymethylmetacrylate (PMMA). The phenomena obtained by plasma treatment (structure formation and antireflective effect) are investigated regarding surface modifications, structure growth, and chemical modifications. Optically, the structure acts like a gradient layer with decreasing effective refractive index towards air, which is suitable for antireflection of PMMA.