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Growth characteristics and texture of cubic boron nitride films produced by CVD

 
: Jiang, X.; Helming, K.; Zhang, W.J.; Matsumoto, S.

:

Chemical vapor deposition: CVD 8 (2002), Nr.6, S.262-265
ISSN: 0948-1907
ISSN: 1521-3862
Englisch
Zeitschriftenaufsatz
Fraunhofer IST ()

Abstract
Thick cubic BN films have been grown by bias‐assisted DC jet plasma CVD (see Figure). The composition, morphology, and structure of the deposited films are studied. The growth is shown to undergo a Van der Drift grain‐evolution competition, forming a preferential alignment of <001> grain axes approximately perpendicular to the film surface.

: http://publica.fraunhofer.de/dokumente/N-38202.html