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Multiple scale modeling of Al2O3 thin film growth in an ion beam sputtering process

: Turowski, M.; Jupé, M.; Melzig, T.; Pflug, A.; Ristau, D.


Lequime, Michel (Ed.) ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Optical Systems Design 2015 : Advances in Optical Thin Films V, 7-10 September 2015, Jena, Germany
Bellingham, WA: SPIE, 2015 (Proceedings of SPIE 9627)
ISBN: 978-1-62841-816-3
Paper 96271M, 8 S.
Conference "Advances in Optical Thin Films" <5, 2015, Jena>
Conference "Optical Systems Design" <2015, Jena>
Fraunhofer IST ()

A multiple scale model approach is presented in order to investigate Al2O3 thin film growth in the framework of an existing Ion Beam Sputtering (IBS) coating process. Therefore, several simulation techniques are combined via optimized interfaces for realizing the concept of a virtual coater. Characteristic coating process parameters of the IBS coating plant are applied as input parameters to model the material transport in the chamber, the energy and angular distribution of the coating material at the substrate, the formation of structural thin film properties, and the optical as well as the electronic layer properties. The resulting thin film properties are validated to the data of an experimental IBS Al2O3 single layer prepared applying the underlying coating facility. The comparison accounts for a good agreement between the modeled layer properties using the virtual coater concept and the experimental characterization data.