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Erratum to "comparison of the ZnO:Al films deposited in static and dynamic modes by reactive mid-frequency magnetron sputtering" (J. Crystal Growth 253 (2003) 117-128)
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2004
Erratum
Titel
Erratum to "comparison of the ZnO:Al films deposited in static and dynamic modes by reactive mid-frequency magnetron sputtering" (J. Crystal Growth 253 (2003) 117-128)
Author(s)
Hong, R.J.
Jiang, X.
Szyszka, B.
Sittinger, V.
Xu, S.H.
Werner, W.
Heide, G.
Zeitschrift
Journal of Crystal Growth
DOI
10.1016/j.jcrysgro.2003.10.085
Language
English
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Fraunhofer-Institut für Schicht- und Oberflächentechnik IST