English
Deutsch
Log In
Password Login
or
Log in with Fraunhofer Smartcard
Research Outputs
Projects
Researchers
Institutes
Statistics
Fraunhofer-Gesellschaft
Home
Fraunhofer-Gesellschaft
Artikel
Improvement of Ta-based thin-film barriers on copper by ion- implantation of nitrogen and oxygen
Details
Full
Export
Statistics
Options
2002
Journal Article
Titel
Improvement of Ta-based thin-film barriers on copper by ion- implantation of nitrogen and oxygen
Author(s)
Wieser, E.
Peikert, M.
Wenzel, C.
Schreiber, J.
Bartha, J.W.
Bendjus, B.
Melov, V.V.
Reuther, H.
Mucklich, A.
Adolphi, B.
Fischer, D.
Zeitschrift
Thin solid films
DOI
10.1016/S0040-6090(02)00273-0
Language
English
google-scholar
View Details
Fraunhofer-Institut für Werkstoff- und Strahltechnik IWS
IZFP-D