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Angle resolved backscatter of HfO2/SiO2 multilayer mirror at 1064 nm

: Wang, J.; Schröder, S.; Trost, M.; Hauptvogel, M.; Duparre, A.


Zelinski, B.J. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Window and dome technologies and materials XIV : 21 - 22 April 2015, Baltimore, Maryland, United States
Bellingham, WA: SPIE, 2015 (Proceedings of SPIE 9453)
ISBN: 978-1-62841-569-8
Paper 94530T, 9 S.
Conference "Window and Dome Technologies and Materials" <14, 2015, Baltimore/Md.>
Fraunhofer IOF ()

Angle resolved light scattering was measured at 1064 nm on an HfO2/SiO2 multilayer mirror deposited via modified plasma ion- assisted deposition. A total backscatter of approximately 4.0x10(-4) was calculated by integrating the angle resolved scattering curves over the backscattering hemisphere. In this way, also the an integrated near angle backscatter of 1.2x10(-4) was derived for angles from 0 degrees to 2 degrees and an integrated near angle scatter of 6x10(-5) was determined in the most critical range from 0.5 degrees to 2 degrees. 12% of the total backscatter originated from the near angle region between 2 degrees and 4 degrees. 36%, 62%, 76% and 86% of the total backscatter were created from 2 degrees to 10 degrees, 20 degrees, 30 degrees and 40 degrees, respectively. Good agreement was obtained for the total backscatter values calculated from the ARS measurements and the top- surface roughness derived by AFM measurements.