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Ellipsometric study of polycrystalline silicon films prepared by low-pressure chemical vapor deposition
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2000
Journal Article
Titel
Ellipsometric study of polycrystalline silicon films prepared by low-pressure chemical vapor deposition
Author(s)
Petrik, P.
Lohner, T.
Fried, M.
Biro, L.P.
Khanh, N.Q.
Gyulai, J.
Lehnert, W.
Schneider, C.
Ryssel, H.
Zeitschrift
Journal of applied physics
DOI
10.1063/1.372085
Language
English
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Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB