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Design and deposition of vacuum-ultraviolet narrow-bandpass filters for analytical chemistry applications

: Yang, M.; Gatto, A.; Kaiser, N.


Applied optics 45 (2006), Nr.7, S.1359-1363
ISSN: 0003-6935
ISSN: 1539-4522
ISSN: 1559-128X
Fraunhofer IOF ()
coating; deposition and fabrication; thin film; optical property

Vacuum-ultraviolet (VUV) narrow-bandpass filters with central wavelengths at 177.5, 180.7, and 193 nm are necessary for analytical chemistry applications and for atomic emission spectrum separation. The emission spectra are so close that the required passbands of these filters are 1 to 2 nm with a maximum of 2 nm. We first investigated the designs based on the Fabry-Perot model with fluoride materials and second the deposition of narrow-bandpass filter components by using evaporation deposition. VUV spectral characterizations show that the filter components meet the requirements for analytical chemistry applications.