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Adjustment of Plasma Properties in Magnetron sputtering by Pulsed Powering in Mixed Unipolar and Bipolar Mode

: Barth, Stephan; Bartzsch, Hagen; Glöß, Daniel; Frach, Peter; Gittner, Matthias; Labitzke, Rainer

Volltext ()

Society of Vacuum Coaters. Digital library. Online resource (2015), 4 S.
Society of Vacuum Coaters (Annual Technical Conference) <58, 2015, Santa Clara/Calif.>
Konferenzbeitrag, Elektronische Publikation
Fraunhofer FEP ()

A new method of pulsed powering the magnetron dischargeusing a pulsed switching of the anode has been developed.Practically it is a combination of the conventional unipolarand bipolar pulsed powering, where the time slices of bothpulse modes can be freely adjusted at a time scale smallerthan 1 millisecond, i.e. much shorter than necessary for thedeposition of one monolayer. This allows varying the averageplasma parameters freely between the typical valuesof unipolar and bipolar pulse mode. During deposition ofpiezoelectric AlN, the fi lm stress could be shifted betweentensile and compressive by changing the pulse mode ratiowhile maintaining piezoelectric properties. Hence, in additionto classical deposition parameters such as pressure ortemperature, this new parameter gives an additional degreeof freedom for optimization of fi lm properties independentfrom sputtering power and deposition rate.