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Design and development of an optical system for EUV-microscopy
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2004
Conference Paper
Titel
Design and development of an optical system for EUV-microscopy
Author(s)
Foltyn, T.
Braun, S.
Gawlitza, P.
Leson, A.
Bergmann, K.
Neff, W.
Walter, K.
Hauptwerk
Advances in mirror technology for X-ray, EUV lithography, laser, and other applications II
Konferenz
Conference "Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications" 2004
DOI
10.1117/12.559675
Language
English
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Fraunhofer-Institut für Lasertechnik ILT
Fraunhofer-Institut für Werkstoff- und Strahltechnik IWS