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2005
Conference Paper
Titel
An approach to the development of tolerance systems for micro- and nanotechnology
Abstract
Production processes with an accuracy in the range down to the nanometer scale gain growing importance in industry. A crucial requirement for their economical application are capable and controlled processes. These in turn are dependent on suitable measurement devices and strategies. Though measurement devices with the required precision are available, strategies and tolerance systems in the considered dimension do not exist. In this chapter an approach to the development of tolerance systems for features in micro- and nanotechnology is presented as the examples micromilling and sputtering as production processes as well as atomic force microscopy as a measurement process.