
Publica
Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten. Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
| Applied physics. A 120 (2015), Nr.3, S.811-816 ISSN: 0340-3793 ISSN: 0721-7250 ISSN: 0947-8396 (Print) ISSN: 1432-0630 (Online) |
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| Englisch |
| Zeitschriftenaufsatz |
| Fraunhofer IWM ( IMWS) () Fraunhofer CSP () |
Abstract
A method for the deposition of molybdenum oxide ((Formula presented.)) with high growth rates at temperatures below 200 (Formula presented.) based on plasma-enhanced atomic layer deposition is presented. The stoichiometry of the over-stoichiometric (Formula presented.) films can be adjusted by the plasma parameters. First results of these layers acting as hole-selective contacts in silicon heterojunction solar cells are presented and discussed.