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Multi-stencil character projection e-beam lithography: A fast and flexible way for high quality optical metamaterials

: Huebner, U.; Falkner, M.; Zeitner, U.D.; Banasch, M.; Dietrich, K.; Kley, E.-B.


Behringer, Uwe F.W. (Ed.) ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
30th European Mask and Lithography Conference 2014 : EMLC 2014, 24-25 June, 2014, Dresden, Germany
Bellingham, WA: SPIE, 2014 (Proceedings of SPIE 9231)
ISBN: 9781628412857
Paper 92310E, 9 S.
European Mask and Lithography Conference (EMLC) <30, 2014, Dresden>
Fraunhofer IOF ()

In this work we report on the strong improvement of pattern quality and significant write-time reduction using Character Projection with a multi-stencil character stage with more than 2000 apertures for the fabrication of nanomaterials and, in particular, on an optical metamaterial, which is called “Metamaterial Perfect Absorber”. The Character Projection ebeam lithography allows the transition from the time-consuming serial to a fast quasi-parallel writing method and opens the way for the fabrication of device areas which are impossible to realize with often in the R&D used SEM based Gaussian electron beam-writers. More than 150.000 times faster than the comparable Gaussian E-beam exposure, 100 times faster and with a factor of 10 improved pattern size homogeneity than the corresponding Variable Shaped E-beam exposure – these are our main results for the fabrication of optical metamaterials using a Variable Shaped E-beam with Character Projection.