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Passivation of optically black silicon wafers by atomic layer deposited Al2O3 films

 
: Otto, M.; Kroll, M.; Käsebier, T.; Salzer, R.; Ziegler, J.; Sprafke, A.; Wehrspohn, R.B.

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Optical Society of America -OSA-, Washington/D.C.:
Optical Nanostructures and Advanced Materials for Photovoltaics : Eindhoven Netherlands November 11-14, 2012
Washington, DC: OSA, 2012
ISBN: 978-1-55752-952-7
Paper PW1B.3
Conference "Optical Nanostructures and Advanced Materials for Photovoltaics - Spectral Conversion" <2012, Eindhoven>
Englisch
Konferenzbeitrag
Fraunhofer IWM ()

Abstract
Optically black silicon nanostructures show excellent light trapping properties. Towards the integration of these structures into a solar cell device, the passivation performance of atomic layer deposited thin Al2O3 films is investigated.

: http://publica.fraunhofer.de/dokumente/N-350448.html