
Publica
Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten. Double-sided diffractive photo-mask for sub-500nm resolution proximity i-line mask-aligner lithography
| Lai, K. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.: Optical microlithography XXVIII : 24 - 26 February 2015, San Jose, California, United States Bellingham, WA: SPIE, 2015 (Proceedings of SPIE 9426) ISBN: 978-1-62841-528-5 Paper 94260E, 9 S. |
| Conference "Optical Microlithography" <28, 2015, San Jose/Calif.> |
|
| Englisch |
| Konferenzbeitrag |
| Fraunhofer IOF () |
Abstract
Diffractive mask-aligner lithography is capable to print structures that have a sub-500-nanometer resolution by using non-contact mode. This requires the use of specially designed phase-masks and dedicated illumination conditions in the Mask-Aligner to obtain the optimal exposure conditions, a spectral filter and a polarizer needs to be placed in the beam path. We introduce here mask designs that includes a polarizer on the top side of a photo-mask and a diffractive element on the bottom one. This enables printing of high resolution structures of arbitrary orientation by using a classical mask-aligner in proximity exposure mode.