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Advanced coatings for next generation lithography

 
: Naujok, Philipp; Yulin, Sergiy A.; Kaiser, Norbert; Tünnermann, Andreas

:

Wood, O.R. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Extreme Ultraviolet (EUV) Lithography VI : 23-26 February 2015, San Jose, California
Bellingham, WA: SPIE, 2015 (Proceedings of SPIE 9422)
ISBN: 9781628415247
Paper 94221K, 7 S.
Conference "Extreme Ultraviolet (EUV) Lithography" <6, 2015, San Jose/Calif.>
Englisch
Konferenzbeitrag
Fraunhofer IOF ()

Abstract
Beyond EUV lithography at 6.X nm wavelength has a potential to extend EUVL beyond the 11 nm node. To implement B-based mirrors and to enable their industrial application in lithography tools, a reflectivity level of > 70% has to be reached in near future. The authors will prove that transition from conventional La/B4C to promising LaN/B4C multilayer coatings leads to enhanced optical properties. Currently a near normal-incidence reflectivity of 58.1% @ 6.65 nm is achieved by LaN/B4C multilayer mirrors. The introduction of ultrathin diffusion barriers into the multilayer design to reach the targeted reflectivity of 70% was also tested. The optimization of multilayer design and deposition process for interface-engineered La/C/B4C multilayer mirrors resulted in peak reflectivity of 56.8% at the wavelength of 6.66 nm. In addition, the thermal stability of several selected multilayers was investigated and will be discussed.

: http://publica.fraunhofer.de/dokumente/N-349859.html