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Gradient index antireflection coatings on glass containing plasma-etched organic layers

: Schulz, Ulrike; Rickelt, Friedrich; Ludwig, Henning; Munzert, Peter; Kaiser, Norbert

Postprint (1.1 MByte; PDF; )

Optical Materials Express 5 (2015), Nr.6, S.1259-1265
ISSN: 2159-3930
Zeitschriftenaufsatz, Elektronische Publikation
Fraunhofer IOF ()

The plasma etching process was originally developed to produce antireflective (AR) nanostructures on polymer substrates. A common vacuum coating system equipped with a plasma source was used. The technique is now applied to deposit and etch organic films on glass. The resulting organic nanostructured layers exhibit a low effective refractive index that can be tuned down to approximately 1.1. Broadband AR coatings were developed by combining inorganic materials and organic nanostructured layers in such a way that the effective index decreases in a stepwise manner or gradually from the index of the substrate to that of the ambient medium. They exhibit AR properties from 400 nm to 1200 nm at normal and oblique light incidence.