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Analysis of distinct scattering of extreme ultraviolet phase and amplitude multilayer defects with an actinic dark-field microscope

: Bahrenberg, L.; Herbert, S.; Tempeler, J.; Maryasov, A.; Hofmann, O.; Danylyuk, S.; Lebert, R.; Loosen, P.; Juschkin, L.

Postprint urn:nbn:de:0011-n-3476050 (7.7 MByte PDF)
MD5 Fingerprint: ecfba6f4663a220491d1e9abb98eaac6
Copyright Society of Photo-Optical Instrumentation Engineers. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.
Erstellt am: 24.11.2015

Wood, O.R. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Extreme Ultraviolet (EUV) Lithography VI : 23-26 February 2015, San Jose, California
Bellingham, WA: SPIE, 2015 (Proceedings of SPIE 9422)
ISBN: 9781628415247
Paper 942229, 9 S.
Conference "Extreme Ultraviolet (EUV) Lithography" <6, 2015, San Jose/Calif.>
Konferenzbeitrag, Elektronische Publikation
Fraunhofer ILT ()
microscopes; multilayers; scattering; mirrors; simulations; nanostructuring

The authors report on experimental and simulative scattering analyses of phase and amplitude defects found in extreme ultraviolet multilayer mirrors, such as mask blanks for EUV lithography. The goal of the analyses is to develop a novel mask blank inspection procedure using one single inspection tool that allows to determine whether a defect is a surface type (amplitude) defect, or a buried type (phase) defect. The experiments were carried out with an actinic dark-field reflection microscope. Programmed defects of both types were fabricated, using different nanostructuring techniques. Analytical and rigorous scattering simulations were carried out to predict and support the experimental results.