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Photocatalytic TiO2 films deposited by reactive magnetron sputtering with unipolar pulsing and plasma emission control systems

: Ohno, S.; Takasawa, N.; Sato, Y.; Yoshikawa, M.; Suzuki, K.; Frach, P.; Shigesato, Y.


Thin solid films 496 (2006), Nr.1, S.126-130
ISSN: 0040-6090
International Symposium on Transparent Oxide Thin Films for Electronics and Optics (TOEO) <4, 2005, Tokyo>
Zeitschriftenaufsatz, Konferenzbeitrag
Fraunhofer FEP ()
photocatalyst; TiO2; reactive sputtering; unipolar pulsing; plasma emission; high rate

TiO2 films with thickness of about 500 nm were deposited on unheated non-alkali glass substrates by reactive magnetron sputtering using one Ti metal target with unipolar pulsed powering of 50 kHz and the plasma emission feedback system (PCU). In order to keep the very high deposition rate, the depositions were carried out in the "transition region" between the metallic and the reactive (oxide) sputter mode where the target surface was metallic and oxidized, respectively. Stable deposition was successfully carried out in the whole "transition region" with PCU at total gas pressure of 3.0 Pa. All the as-deposited films deposited in the "transition region" showed amorphous structure, which performed very low photocatalytic activity. After the post-annealing in air at higher than 300 °C, all the films crystallized to anatase polycrystalline structure. They performed both photoinduced decomposition of acetaldehyde and photoinduced hydrophilicity under UV light illumination. The highest deposition rate in this study to deposit the photocatalytic TiO2 films in the "transition region" was 90 nm/min, which was over twenty times higher than that for conventional sputter deposition processes.