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Precursor strategies for metallic nano- and micropatterns using soft lithography

 
: Wisser, Florian M.; Schumm, Benjamin; Mondin, Giovanni; Grothe, Julia; Kaskel, Stefan

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Journal of materials chemistry. C, Materials for optical and electronic devices 3 (2015), Nr.12, S.2717-2731
ISSN: 2050-7526
ISSN: 2050-7534
Englisch
Zeitschriftenaufsatz
Fraunhofer IWS ()
soft lithography; Metal Thin Film; precursor; patterning

Abstract
Soft lithographic methods describe a set of printing methods which are widely used for the preparation of structured surfaces. Structured surfaces are essential components in the field of (opto-)electronic devices such as organic light emitting diodes, photovoltaics or organic field effect transistors. In recent years, crucial progress has been achieved in the development of patterned metal coatings for these applications. This review focusses on new strategies for soft lithographical printing of metal structures emphasizing the subtle interplay of printing techniques, metal precursor chemistry, and surface functionalization strategies.

: http://publica.fraunhofer.de/dokumente/N-336779.html