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NANO-motheye antireflection pattern by plasma treatment of polymers

 
: Kaless, A.; Schulz, U.; Munzert, P.; Kaiser, N.

:

Plasma surface engineering, PSE 2004 : Proceedings of the Ninth International Conference on Plasma Surface Engineering, Garmisch-Partenkirchen, Germany, September 13 - 17, 2004
Amsterdam: Elsevier, 2005 (Surface and coatings technology 200.2005,1/4)
S.58-61
International Conference on Plasma Surface Engineering (PSE) <9, 2004, Garmisch-Partenkirchen>
Englisch
Konferenzbeitrag, Zeitschriftenaufsatz
Fraunhofer IOF ()

Abstract
The application of plasma treatment on transparent PMMA substrates has shown an effect of reducing surface reflection. This effect is based on a refractive index gradient created by a combination of chemical decomposition and physical etching on the polymer surface. A stochastic nanostructure was found by means of AFM and SEM. Conditions for the plasma treatment process and properties of the modified PMMA surfaces have been discussed.

: http://publica.fraunhofer.de/dokumente/N-33586.html