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Atmospheric plasma deposition of SiO2 films for adhesion promoting layers on titanium

: Kotte, Liliana; Haag, Jana; Mertens, Tobias; Kaskel, Stefan

Postprint (906 KByte; PDF; )

Metals 4 (2014), Nr.4, S.639-646
ISSN: 2075-4701
European Commission EC
FP7; 309530
Pliant, Process Line Implementation for Applied Surface Nanotechnologies
Zeitschriftenaufsatz, Elektronische Publikation
Fraunhofer IWS ()
SiO2 film; AP-PECVD; titanium alloy; adhesion layer; wedge test

This paper evaluates the deposition of silica layers at atmospheric pressure as a pretreatment for the structural bonding of titanium (Ti6Al4V, Ti15V3Cr3Sn3Al) in comparison to an anodizing process (NaTESi process). The SiO2 film was deposited using the LARGE plasma source, a linearly extended DC arc plasma source and applying hexamethyldisiloxane (HMDSO) as a precursor. The morphology of the surface was analyzed by means of SEM, while the characterization of the chemical composition of deposited plasma layers was done by XPS and FTIR. The long-term durability of bonded samples was evaluated by means of a wedge test in hot/wet condition. The almost stoichiometric SiO2 film features a good long-term stability and a high bonding strength compared to the films produced with the wet-chemical NaTESi process.