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Specific aspects of roughness and interface diffusion in non-periodic Mo/Si multilayers

: Braun, Stefan; Gawlitza, Peter; Menzel, Maik; Friedrich, Wolfgang; Schmidt, Jürgen; Leson, Andreas


Morawe, C. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Advances in X-Ray/EUV Optics and Components IX : 18–20 August 2014, San Diego, California
Bellingham, WA: SPIE, 2014 (Proceedings of SPIE 9207)
ISBN: 978-1-62841-234-5
Paper 920707, 10 S.
Conference "Advances in X-Ray/EUV Optics and Components" <9, 2014, San Diego/Calif.>
Fraunhofer IWS ()
antireflection coatings; coating techniques; light reflection; mirrors; molybdenum; optical fabrication; optical multilayers; silicon; x-ray optics

Most of the currently used reflective coatings for EUV and X-ray mirrors are periodic nanometer multilayers. Depending on the number of periods and the absorption in the multilayer stack a certain band width of the incoming radiation can be reflected. In order to increase the integral reflectance or to accept larger ranges of incidence angles, non-periodic multilayers are needed. With the transition from periodic to non-periodic multilayers new challenges arise for the deposition process. Since the reflectance spectra are sensitive to every single layer thickness a precise coating control and an exact knowledge of the interface reactions are required. Furthermore substrate roughness influences the reflectance spectra. With an advanced coating process using additional ion bombardment during thin film growth the integrated reflectance of broadband mirrors can be conserved even for an initial substrate roughness of about 0.7 nm rms.