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Simulation of plasma deposition processes

 
: Pflug, A.; Siemers, M.; Schwanke, C.; Szyszka, B.

2nd International Conference on Power Electronics for Plasma Engineering 2011. Conference Proceedings : Freiburg, Germany, May 25, 2011; PE²
Zielonka: TRUMPF Huettinger, 2011
S.3.1-3.2
International Conference on Power Electronics for Plasma Engineering (PE2) <2, 2011, Freiburg>
Englisch
Konferenzbeitrag
Fraunhofer IST ()

Abstract
In order to meet the requirements for efficient further development of vacuum deposition technology, we developed a parallel, Particle-in-Cell Monte-Carlo (PIC-MC) simulation framework for description of rarefied gas flows and gas discharges. With this tool a large variety of low-pressure and/or plasma-based deposition techniques can be addressed. This work gives an introduction into the basic principles of PIC-MC simulation and demonstrates its application on magneton sputtering.

: http://publica.fraunhofer.de/dokumente/N-314988.html