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Ptychography with multilayer Laue lenses

: Kubec, Adam; Braun, Stefan; Niese, Sven; Krüger, Peter; Patommel, Jens; Hecker, Michael; Leson, Andreas; Schroer, Christian G.

Reprint urn:nbn:de:0011-n-3116368 (565 KByte PDF)
MD5 Fingerprint: b5d76e8402375fd04111cff28fd9c7b3
Erstellt am: 2.3.2017

Journal of synchrotron radiation 21 (2014), Nr.5, S.1122-1127
ISSN: 0909-0495
ISSN: 1600-5775
Zeitschriftenaufsatz, Elektronische Publikation
Fraunhofer IWS ()
Fraunhofer IKTS ()
X-ray nanofocusing; multilayer Laue lens; ptychography; scanning X-ray microscopy

Two different multilayer Laue lens designs were made with total deposition thicknesses of 48 mu m and 53 mu m, and focal lengths of 20.0 mm and 12.5 mm at 20.0 keV, respectively. From these two multilayer systems, several lenses were manufactured for one-and two-dimensional focusing. The latter is realised with a directly bonded assembly of two crossed lenses, that reduces the distance between the lenses in the beam direction to 30 mm and eliminates the necessity of producing different multilayer systems. Characterization of lens fabrication was performed using a laboratory X-ray microscope. Focusing properties have been investigated using ptychography.