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Plasma-unterstütztes chemisches Gasabscheidungs-Verfahren mit erhöhter Plasmadichte

PLASMA-ASSISTED CHEMICAL GAS SEPARATION METHOD HAVING INCREASED PLASMA DENSITY AND DEVICE FOR IMPLEMENTING THE METHOD
 
: Reynvaan, Jakob

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Frontpage ()

DE 102012209650 A1: 20120608
Deutsch
Patent, Elektronische Publikation
Fraunhofer IAF ()

Abstract
The invention relates to a method and a device for coating surfaces of a substrate (8) according to the technique of plasma-assisted chemical gas phase separation. The basic idea of the present invention is to increase the ion concentration prevailing in the plasma such that more ions adsorb on the substrate (8) and promote the layer growth (12). According to the invention, the ion concentration is increased by forming a so-called fireball on the surface of the substrate (8) to be coated. The term fireballs refers to the ionization processes that form on electrode surfaces (2) as spontaneous small brightly luminescent appearances in plasma processes. For this purpose, an electrode (2) is introduced into an existing background plasma and connected to a positive potential (4).

: http://publica.fraunhofer.de/dokumente/N-310944.html