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High power impulse magnetron sputtering - HIPIMS

: Bandorf, R.; Sittinger, V.; Bräuer, G.


Cameron, D.; Hashmi, S.:
Comprehensive materials processing. Vol.4: Films and coatings. Technology and recent development
Amsterdam: Elsevier, 2014
ISBN: 978-0-08-096604-5
ISBN: 978-0-08-096532-1
ISBN: 978-0-08-096533-8
Aufsatz in Buch
Fraunhofer IST ()

High power impulse magnetron sputtering (HIPIMS) or high power pulse magnetron sputtering is a relatively new technology in the transition from academic research to industrial applications. By using ions instead of neutrals, or at least a significant fraction of ionized species, for thin film deposition, the resulting film properties can be altered significantly. There are different approaches for ionized sputtering, and HIPIMS is the most recent development (28).