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Advantageous possibilities, design aspects and technical use of double ring magnetron sputter source
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1995
Conference Paper
Titel
Advantageous possibilities, design aspects and technical use of double ring magnetron sputter source
Author(s)
Frach, P.
Goedicke, K.
Winkler, T.
Gottfried, C.
Walde, H.
Hentsch, W.
Hauptwerk
4th International Conference on Plasma Surface Engineering 1994. Papers
Konferenz
International Conference on Plasma Surface Engineering 1994
DOI
10.1016/0257-8972(95)08224-7
Language
English
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Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP