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High-radiance LDP source for mask inspection application

: Teramoto, Y.; Santos, B.; Mertens, G.; Kops, R.; Kops, M.; Küpper, F.; Niimi, G.; Yabuta, H.; Nagano, A.; Yokoyama, T.; Yoshioka, M.; Shirai, T.; Ashizawa, N.; Sato, H.; Nakamura, K.; Kasama, K.


Wood, O.R. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Extreme ultraviolet (EUV) lithography V. Vol.1 : 24 - 27 February 2014, San Jose, California, United States; Extreme Ultraviolet (EUV) Lithography V Conference at the 2014 SPIE Advanced Lithography Symposium
Bellingham, WA: SPIE, 2014 (Proceedings of SPIE 9048)
ISBN: 978-0-8194-9971-4
Paper 904813, 8 S.
Extreme Ultraviolet (EUV) Lithography Conference <5, 2014, San Jose/Calif.>
Advanced Lithography Symposium <2014, San Jose/Calif.>
Fraunhofer ILT ()

High-radiance EUV source is needed for actinic mask inspection applications. LDP source for a lithography application was found to be also able to provide sufficient radiance for mask inspection purpose. Since the plasma size of LDP is properly larger than LPP, not only radiance but also power is suitable for mask inspection applications. Operating condition such as discharge pulse energy, discharge frequency and laser parameter have been tuned to maximize radiance. Introduction of new techniques and several modifications to LDP source have brought radiance level to 180 W/mm2/sr at plasma (or 130 W/mm2/sr as clean-photon radiance). The LDP source is operated at moderate power level in order to ensure sufficient component lifetime and reliability. The first lifetime test done at 10 kHz resulted in 6.5 Gpulse without failure. Debris mitigation system has been successfully installed showing optical transmission as high as 71 %.