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High resolution patterning for sub 30 nm technology nodes using a ceramic based dual hard mask

: Paul, J.; Rudolph, M.; Riedel, S.; Thrun, X.; Beyer, V.; Wege, S.; Hohle, C.


Mathad, S. ; Electrochemical Society -ECS-; Japan Society of Applied Physics -JSAP-:
Plasma Processing 19 : Symposium “Plasma Processing 19”, held during the PRiME 2012 joint international meeting, held in Honolulu, Hawaii, from October 7 to 12, 2012
Pennington, NJ: ECS, 2013 (ECS transactions Vol.50, Nr.46)
ISBN: 978-1-62332-082-9 (Print)
ISBN: 978-1-60768-434-3 (PDF)
Symposium "Plasma Processing" <19, 2012, Honolulu/Hawaii>
Pacific Rim Meeting on Electrochemical and Solid-State Science (PRiME) <2012, Honolulu/Hawaii>
Fraunhofer CNT ()

A dual hard mask concept for high resolution patterning has been evaluated with focus on highly selective etching processes for semiconductor manufacturing. The integration of thin SiO2 and ZrO2 hard mask materials enables highly selective patterning via plasma etch processes for future technology nodes. The patterning sequence is demonstrated for hole arrays with sizes down to 25 nm using a 50 nm thin resist which leads to the fabrication of trenches in silicon with aspect ratios up to 20:1. Alternative ZrO2 based materials were investigated with focus on surface roughness reduction since it influences the final line edge roughness (LER). Here Si-doped ZrO2 (ALD) was compared to the undoped and crystalline ZrO2 as main selective material.