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Introduction of an innovative water based photoresist stripping process using intelligent fluids

 
: Rudolph, Matthias; Felten, Peter; Thrun, Xaver; Schumann, Dirk; Esche, Silvio; Hohle, Christoph

:

Wallow, T.I. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Advances in Patterning Materials and Processes XXXI : San Jose, California, USA; February 2014
Bellingham: SPIE, 2014 (Proceedings of SPIE 9051)
ISBN: 978-0-8194-9974-5
Paper 90510T, 10 S.
Conference "Advances in Patterning Materials and Processes" <31, 2014, San Jose/Calif.>
Englisch
Konferenzbeitrag
Fraunhofer IPMS ()

Abstract
The usage of phasefluid based stripping agents to remove photoresists from silicon substrates was studied. Due to their highly dynamic inner structure phasefluids offer a new working principle, they are penetrating layers through smallest openings and lift off the material from the surface. These non-aggressive stripping fluids were investigated regarding their cleaning efficiency as well as contamination behavior to enable usage in semiconductor and MEMS manufacturing. A general proof of concept for the usage of phasefluids in resist stripping processes is shown on silicon coupons and BKM’s are given for different resist types. In addition a baseline process on 12inch wafers has been developed and characterized in terms of metallic and ionic impurities and defect level.

: http://publica.fraunhofer.de/dokumente/N-298185.html