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DEVICE AND METHOD FOR GAS FLOW SPUTTERING

 
: Bandorf, Ralf

:
Frontpage ()

WO 2010EP02860 A: 20100510
Englisch
Patent, Elektronische Publikation
Fraunhofer IST ()

Abstract
The present invention relates to a device and a method for glass flow sputtering, sputtering material to be applied to a substrate being produced by means of a gas flow sputtering source and conducted through a coil having at least one winding after leaving the gas flow sputtering source.

: http://publica.fraunhofer.de/dokumente/N-297845.html