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2004
Journal Article
Titel
Localized deposition of hydrocarbon using plasma activated chemical vapour deposition
Abstract
The new technique of micro-jet chemical vapor deposition was used to deposit hydrocarbon on a glass substrate kept at a short distance from a capillary injector. Acetylene gas was used as reactant and the decomposition was achieved via plasma excitation. Plasma was generated and sustained in a localized manner between two copper electrodes. This new technique is characterized by a high-deposition rate (hundreds of microns per second), a low spread (i.e. a high aspect ratio) and low-power input to the plasma (high efficiency).