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Towards automatic mask and source optimization for optical lithography
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2004
Conference Paper
Titel
Towards automatic mask and source optimization for optical lithography
Author(s)
Erdmann, A.
Fühner, T.
Schnattinger, T.
Tollkühn, B.
Hauptwerk
Optical microlithography XVII. Vol.2
Konferenz
Conference "Optical Microlithography" 2004
DOI
10.1117/12.533215
Language
English
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Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB