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New DC sputter sources for the large scale deposition of oxide films

: Höfer, M.; Jung, A.; Jung, T.; Kricheldorf, H.-U.; Schmidt, F.

Society of Vacuum Coaters -SVC-, Albuquerque/NM:
Society of Vacuum Coaters. 43rd Annual Technical Conference 2000. Proceedings : April 15-20, 2000, Denver, Colorado
Albuquerque: SVC, 2000
ISSN: 0737-5921
Society of Vacuum Coaters (Annual Technical Conference) <43, 2000, Denver/Colo.>
Fraunhofer IST ()
gas flow sputtering; titanium dioxide; reactive deposition; indium tin oxide

For a number of important oxide film materials conventional magnetron sputtering suffers from low deposition rates and difficult process controlling. The Gas Flow Sputtering technique GFS is able to circumvent both the rate and the stability problem owing to it's unique principle of operation. Recently, at the Fraunhofer IST new GFS sputtering sources with target lengths of up to 1 m have been developed an are successfully operated. Using alumina as test film material, it was shown that the GFS process can be up-scaled straight forward. Further results demonstrate the suitability of the GFS technique for the deposition of high quality TiO2 and ITo films with typical deposition rates of some 10 µm/h.