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Properties of TCO-films prepared by reactive magnetron sputtering

: Szyszka, B.

Society of Vacuum Coaters -SVC-, Albuquerque/NM:
Society of Vacuum Coaters. 43rd Annual Technical Conference 2000. Proceedings : April 15-20, 2000, Denver, Colorado
Albuquerque: SVC, 2000
ISSN: 0737-5921
Society of Vacuum Coaters (Annual Technical Conference) <43, 2000, Denver/Colo.>
Fraunhofer IST ()
transparent coating; conductive coating; reactive deposition; glass substrate

This study is on the development of new, economic transparent and conductive oxide layers by reactive sputtering. Aluminium doped zinc oxide films have been prepared by reactive mid-frequency magnetron sputtering at deposition rate of approximately 9 nm/s and substrate temperature of 100°C to 200°C. Process stabilization in the metallic mode has been performed by the control of plasma impedance due to the adjustment of oxygen flow. Metallic Zn:Al targets with aluminium content in the range of 0.9 to 2.9 wt. % have been used. ZnO:Al films prepared by this technique exhibit low resistivity of 300 µ cm at 200°C substrate temperature and 480 µ cm at 100°C substrate temperature (film thickness of 500 nm).