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Sensor und Verfahren zum Herstellen eines Sensors

Sensor and method for manufacturing a sensor
 
: Kropelnicki, Piotr; Vogt, Holger; Weiler, Dirk

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Frontpage ()

DE 102011081641 A1: 20110826
Deutsch
Patent, Elektronische Publikation
Fraunhofer IMS ()

Abstract
The sensor (100) has two spacers (130-1, 130-2) located on a substrate (110). A retaining structure (140-1) is laterally held adjacent to a membrane (120) from one of the spacers. An electrode (150-1) is contacted on a main side (122) of the membrane. Another retaining structure (140-2) is laterally held adjacent to a membrane from the other spacer. Another electrode (150-2) is contacted on another main side (124) of the membrane facing the former main side such that the membrane is suspended over the spacers and electrically connected with contact surfaces (112-1, 112-2) of the substrate. The membrane comprises a semiconductor layer made of a single crystalline material i.e. silicon, or an amorphous material. An independent claim is also included for a method for manufacturing a sensor.

: http://publica.fraunhofer.de/dokumente/N-270783.html