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Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten. Alignment accuracy in a mask aligner using substrate conformal imprint lithography (SCIL)
Poster presented at 39th International Conference on Micro and Nano Engineering, MNE 2013, 16 - 19 September 2013, London
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Poster urn:nbn:de:0011-n-2688268 (811 KByte PDF) MD5 Fingerprint: 6ea6cb4b59a88dfb8d826c55f9c95968 Erstellt am: 4.12.2013 |
| 2013, 1 Folie
International Conference on Micro and Nano Engineering (MNE) <39, 2013, London> |
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| Englisch |
| Poster, Elektronische Publikation |
| Fraunhofer IISB () |